Terahertz emission from interdigitated photoconductive antennas based on Ge-on-Si
Authors
Dhanashree Chemate, Abhishek Singh, Ruturaj Puranik, Utkarsh Pandey, Dipti Gupta, Siddhartha P. Duttagupta, Shriganesh S. Prabhu
Categories
Abstract
An interdigitated photoconductive antenna (i-PCA) for terahertz (THz) emission with a novel metal-insulator-semiconductor interface is designed with the aim of developing compact and scalable THz devices. The photoconductive material is an amorphous germanium (Ge) film deposited using DC magnetron sputtering. The antenna electrodes are composed of gold-germanium (AuGe). With the integration of a silicon dioxide (SiO2) layer that acts as an electrical mask on alternate active areas, we present a simple approach to fabricate a large-area i-PCA. Along with a simplified fabrication compared to other existing designs, our approach increases the electrical robustness of the emitter and reduces the inactive gap area on the device. The i-PCA is capable of THz emission up to 2.5 THz and 36 dB signal-to-noise ratio (SNR), and is promising for applications in CMOS technologies.
Terahertz emission from interdigitated photoconductive antennas based on Ge-on-Si
Categories
Abstract
An interdigitated photoconductive antenna (i-PCA) for terahertz (THz) emission with a novel metal-insulator-semiconductor interface is designed with the aim of developing compact and scalable THz devices. The photoconductive material is an amorphous germanium (Ge) film deposited using DC magnetron sputtering. The antenna electrodes are composed of gold-germanium (AuGe). With the integration of a silicon dioxide (SiO2) layer that acts as an electrical mask on alternate active areas, we present a simple approach to fabricate a large-area i-PCA. Along with a simplified fabrication compared to other existing designs, our approach increases the electrical robustness of the emitter and reduces the inactive gap area on the device. The i-PCA is capable of THz emission up to 2.5 THz and 36 dB signal-to-noise ratio (SNR), and is promising for applications in CMOS technologies.
Authors
Dhanashree Chemate, Abhishek Singh, Ruturaj Puranik et al. (+4 more)
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